Unlike molecular interactions for CO2-N2 and a few other gas mixtures
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چکیده
منابع مشابه
Phase diagrams of CO2 and CO2 -N2 gas mixtures and their application in compression processes
Phase diagrams of carbon dioxide, nitrogen and their mixtures with different amounts of nitrogen (e.g. 5 mol%, 10 mol% N2) were calculated with high accuracy with the NIST Reference Fluid Thermodynamic and Transport Properties database program REFPROP® for up to 200 bar, as well as density-pressure diagrams. Beside the use of carbon dioxide as a solvent for supercritical fluid extraction, incre...
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The adsorption capacity and selectivity of carbon dioxide and nitrogen at 298 K have been evaluated for two series of MMOFs built on metal paddle-wheel building units, including non-interpenetrated Zn(BDC)(TED)(0.5) (1), Zn(BDC-OH)(TED)(0.5) (2), Zn(BDC-NH(2))(TED)(0.5) (3), and interpenetrated Zn(BDC)(BPY)(0.5) (4), Zn(BDC)(DMBPY)(0.5) (5), Zn(NDC)(BPY)(0.5) (6) and Zn(NDC)(DMBPY)(0.5) (7) fra...
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Carbon dioxide (CO2) release from the exhaust gas streams of power plants that burn fossil fuels contributes the most emission of this gas, which includes more than half of the greenhouse effects. Thus, the separation of CO2 from exhaust gases is one of the main environmental concerns. Membrane technology, due to many advantages, has attracted many research attentions among the various gas sepa...
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BACKGROUND The property values of therapeutic gas mixtures are important in designing devices, defining delivery parameters, and in understanding the therapeutic effects. In the medical related literature the vast majority of articles related to gas mixtures report property values only for the pure substances or estimates based on concentration weighted averages. However, if the molecular size ...
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The chemical dry etching of silicon nitride (Si3N4)and silicon nitride (SiO2) in a downstream plasma reactor using CF4, O2, and N2 has been investigated. A comparison of the Si3N4 and SiO2 etch rates with that of polycrystalline silicon shows that the etch rates of Si3N4 and SiO2 are not limited by the amount of fluorine arriving on the surface only. Adding N2 in small amounts to a CF4 /O2 micr...
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ژورنال
عنوان ژورنال: Physica
سال: 1961
ISSN: 0031-8914
DOI: 10.1016/0031-8914(61)90129-x